Interface Stability and Silicide Formation in High Temperature Stable MoxSi1-x/Si Multilayer Soft X-Ray Mirrors Studied by Means of X-Ray Diffraction and [...]
In: Physica status solidi A: applications and materials science, Jg. 145 H. 2, S. 539-550
Mo 0,5 Si 0,5/Si multilayer soft x-ray mirrors, high thermal stability, and normal incidence reflectivity
In: Applied Physics Letters, Jg. 63 H. 16, S. 2207-2209Smoothing of interfaces in ultrathin Mo/Si multilayers by ion bombardment
In: Thin Solid Films, Jg. 228 H. 1-2, S. 154-157Thermal stability of Mo/Si multilayer soft-X-ray mirrors fabricated by electron-beam evaporation
In: Applied Physics A: Materials Science and Processing, Jg. 58 H. 4, S. 371-376