Identification of Xe interface states in the Xe(111)/Pt(111) system by spin-resolved photoelectron spectroscopy
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Influence of autoionisation and predissociation on the photoelectron parameters in HBr
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In: Surface Science, Jg. 162 H. 1-3, S. 96-102Interface Stability and Silicide Formation in High Temperature Stable MoxSi1-x/Si Multilayer Soft X-Ray Mirrors Studied by Means of X-Ray Diffraction and HRTEM
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