Höink, Volker: Magnetoresistance and ion bombardment induced magnetic patterning. 2008
Inhalt
- 1 Introduction
- 2 Theoretical and experimental basics
- 2.1 Exchange Bias
- 2.2 Ion bombardment induced magnetic patterning
- 2.3 Tunnel magnetoresistance
- 2.4 Interlayer exchange coupling
- 2.5 Néel coupling
- 2.6 Measurement methods and experimental setups
- 2.6.1 Sputter deposition
- 2.6.2 Topographic patterning
- 2.6.3 Magnetic patterning
- 2.6.4 Magnetoresistance measurements
- 2.6.5 IETS
- 2.6.6 MOKE
- 2.6.7 AGM
- 2.6.8 PEEM
- 2.6.9 MFM
- 2.6.10 SEM
- 2.6.11 Ion bombardment
- 2.7 Simulation programs
- 3 Applicability of IBMP
- 3.1 X-ray scattering on a magnetic grating
- 3.2 Thermal stability of magnetic patterns
- 3.2.1 Experiment
- 3.2.2 AGM investigations
- 3.2.3 PEEM: only magnetic pattern
- 3.2.4 PEEM: crossed gratings
- 3.2.5 PEEM: elliptic & triangular
- 3.2.6 Summary
- 3.3 IB and pinned artificial ferrimagnet
- 3.4 IBMP of MTJs with alumina barrier
- 3.5 Postannealing of ion bombarded Al2O3 based MTJs
- 3.5.1 Postannealing of standard Al2O3 based MTJs
- 3.5.2 Postannealing of inverted Al2O3 based MTJs
- 3.5.3 Summary
- 3.6 IBMP of single MTJs
- 3.7 IBMP and standard MgO based MTJs
- 3.7.1 Effect of IB on standard MgO based MTJs
- 3.7.2 Postannealing of standard MgO based MTJs
- 3.7.3 Summary
- 3.8 IBMP and inverted MgO based MTJs
- 4 Applications
- 4.1 Magnetically patterned sensor
- 4.2 Nanoparticle manipulation by strayfields
- 4.3 Reconfigurable Magnetic Logic
- 5 Summary
- 6 Acknowledgments
- A Layer stacks
- B Thermal stability --- elliptic structures
- C Ru--AFi --- calculated magnetization reversal
- D Ru--AFi --- calculation with Ki
- E Cu--AFi --- measurement and calculation